Looking to contact semiconductor manufacturer teams for wet process equipment? Meraif supports Southeast Asia buyers with solutions for silicon wafers, IC wafers, advanced packaging, IC substrates, and SMT—backed by patented nozzle technology, vacuum negative pressure spray cleaning, and supercritical fluid expertise for high-precision semiconductor cleaning.
A compact semiconductor cleaning machine designed for single wafers, photomasks, and precision carriers. The enclosed automated system supports stable handling, contamination removal, and process control for fabs, packaging lines, R&D labs, and scarce equipment sourcing projects worldwide. OEM ready
This equipment is suitable for cleaning 6”, 7”, and 9” photomasks, equipped with a multi-stage precision filtration system, meeting Class 10/100 cleanliness requirements. It employs ion air blowing technology to achieve 360° high-precision cleaning, supports mainstream communication protocols and automated integration, and complies with SEMI S2 and CE semiconductor standards.
