Single-crystal wafer mask cleaning machine
Single-crystal wafer mask cleaning machine
  1. Single-crystal wafer mask cleaning machine
  2. Single-crystal wafer mask cleaning machine

Single Wafer Mask Cleaning Machine for Semiconductor Fab

A compact semiconductor cleaning machine designed for single wafers, photomasks, and precision carriers. The enclosed automated system supports stable handling, contamination removal, and process control for fabs, packaging lines, R&D labs, and scarce equipment sourcing projects worldwide. OEM ready

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This equipment is suitable for cleaning 6”, 7”, and 9” photomasks, equipped with a multi-stage precision filtration system, meeting Class 10/100 cleanliness requirements. It employs ion air blowing technology to achieve 360° high-precision cleaning, supports mainstream communication protocols and automated integration, and complies with SEMI S2 and CE semiconductor standards.

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