ماكينة تنظيف قناع الرقاقة الواحدة لتصنيع أشباه الموصلات

This equipment is suitable for cleaning 6”, 7”, and 9” photomasks, equipped with a multi-stage precision filtration system, meeting Class 10/100 cleanliness requirements. It employs ion air blowing technology to achieve 360° high-precision cleaning, supports mainstream communication protocols and automated integration, and complies with SEMI S2 and CE semiconductor standards.