¿Desea ponerse en contacto con equipos de fabricantes de semiconductores para equipos de proceso húmedo? Meraif apoya a los compradores del sudeste asiático con soluciones para obleas de silicio, obleas de CI, envasado avanzado, sustratos de CI y SMT, respaldadas por tecnología de boquillas patentada, limpieza por pulverización de presión negativa al vacío y experiencia en fluidos supercríticos para la limpieza de semiconductores de alta precisión.
TFT glass horizontal cleaning machine for flat panel display and semiconductor production lines. It supports continuous panel transfer, wet cleaning, rinsing and drying processes to remove particles, residues and contaminants before coating, bonding, inspection or assembly in cleanroom environments.
The single-wafer wet etching spin processor is suitable for etching metal layers such as UBM and RDL, as well as second- and third-generation 2.5 and 3.5 generation etching. The chamber allows for multi-chemical etching, with precise and controllable swing arm and spraying. Acid and alkali are recycled separately without pollution. The integrated PTFE chamber prevents backsplashing, the entire unit is corrosion-resistant, and the interface is simple, meeting the needs of mass production and engineering.
