¿Desea ponerse en contacto con equipos de fabricantes de semiconductores para equipos de proceso húmedo? Meraif apoya a los compradores del sudeste asiático con soluciones para obleas de silicio, obleas de CI, envasado avanzado, sustratos de CI y SMT, respaldadas por tecnología de boquillas patentada, limpieza por pulverización de presión negativa al vacío y experiencia en fluidos supercríticos para la limpieza de semiconductores de alta precisión.
Fully automatic FOUP cleaning machine designed for semiconductor fabs and wafer handling lines. It supports efficient carrier washing, rinsing and drying to help remove particles, chemical residues and ionic contamination, improving FOUP cleanliness, process stability and production yield overall.
This fully automatic FOUP cleaning machine is specifically designed for cleaning 12-inch FOUP/FOSB particles and metal ions, making it suitable for the semiconductor industry. The equipment employs multi-stage precision filtration to meet Class 10/100 cleanliness standards, provides 360° spray cleaning without blind spots, and is equipped with a vacuum drying system. It supports mainstream communication and automation integration, and complies with SEMI S2 and CE standards.
