Suchen Sie Kontakt zu Teams von Halbleiterherstellern für Nassprozessanlagen? Meraif unterstützt Käufer in Südostasien mit Lösungen für Siliziumwafer, IC-Wafer, fortschrittliche Verpackungen, IC-Substrate und SMT - unterstützt durch patentierte Düsentechnologie, Vakuum-Unterdruck-Sprühreinigung und überkritische Flüssigkeitsexpertise für hochpräzise Halbleiterreinigung.
This single-crystal rotary wafer etching machine is designed for semiconductor wet-process applications requiring controlled rotation, uniform chemical etching and stable batch handling. It supports wafer-level preparation, cleaning and surface treatment in fabs, labs and equipment upgrade projects.
This equipment is suitable for UBM, RDL, BGBM, and second- and third-generation semiconductor etching processes. A single chamber supports multiple processes, and the chemical recovery rate is high. The swing arm is programmable, and the magnetic levitation pump provides uniform liquid control. Separate acid and alkali chambers prevent cross-contamination. The integrated PTFE curved chamber resists backsplashing, and the entire unit is acid and alkali resistant, stable, and durable.
