Suchen Sie Kontakt zu Teams von Halbleiterherstellern für Nassprozessanlagen? Meraif unterstützt Käufer in Südostasien mit Lösungen für Siliziumwafer, IC-Wafer, fortschrittliche Verpackungen, IC-Substrate und SMT - unterstützt durch patentierte Düsentechnologie, Vakuum-Unterdruck-Sprühreinigung und überkritische Flüssigkeitsexpertise für hochpräzise Halbleiterreinigung.
This fully automatic FOUP cleaning machine is designed for semiconductor fabs requiring reliable wafer carrier cleaning, rinsing, and drying. Its enclosed stainless-steel structure supports contamination control, stable operation, and customized integration for advanced manufacturing lines worldwide
This equipment is based on the original semi-automatic FOUP cleaning machine. By adding two sets of cleaning baskets, the maximum number of wafers that can be cleaned at one time is increased. At the same time, the equipment is connected to a fully automatic load port and a buffer device, which enables fully automatic wafer carrier loading/unloading and fully automatic cassette opening, while buffering up to 24 wafer foups of 12-inch wafers.
