댓글 양식

습식 공정 장비에 대해 반도체 제조업체 팀에 문의하고 싶으신가요? Meraif는 특허받은 노즐 기술, 진공 음압 스프레이 세척, 고정밀 반도체 세척을 위한 초임계 유체 전문성을 바탕으로 실리콘 웨이퍼, IC 웨이퍼, 첨단 패키징, IC 기판 및 SMT용 솔루션을 동남아시아 바이어에게 제공합니다.

Meraif
2006년에 시작
댓글 양식

포토레지스트 제거 금속 박리 웨이퍼 세정 시스템

Photoresist removal and metal stripping wafer system for semiconductor wet processing, designed for cleaning, stripping and surface preparation in fabs. We support global sourcing of scarce equipment, parts, accessories and customized automation solutions for wafer manufacturing lines worldwide.

제품 양식
사랑을 나누세요

This equipment supports 6/8/12-inch wafers, combining the advantages of batch and single-wafer processes. It integrates solvent immersion, high-pressure resist removal, and two-fluid cleaning. The immersion tank is equipped with megasonic technology and can be flexibly configured. Featuring two-fluid and high-pressure jet cleaning, it delivers excellent resist and particle removal performance. Its modular design allows for expansion, and its stable and consistent program control ensures high wafer cleanliness.