ウェットプロセス装置の半導体メーカーチームとのコンタクトをお探しですか？メライフは、特許取得済みのノズル技術、真空負圧スプレー洗浄、高精度半導体洗浄のための超臨界流体の専門知識に裏打ちされた、シリコンウェーハ、ICウェーハ、高度なパッケージング、IC基板、SMTのためのソリューションで東南アジアのバイヤーをサポートしています。.
メライフ
2006年開始
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中華人民共和国広東省深圳市南山区南山小区天健悦湾富1号ビル3室1504室
Photoresist Removal Metal Stripping Wafer Cleaning System
Photoresist removal and metal stripping wafer system for semiconductor wet processing, designed for cleaning, stripping and surface preparation in fabs. We support global sourcing of scarce equipment, parts, accessories and customized automation solutions for wafer manufacturing lines worldwide.
This equipment supports 6/8/12-inch wafers, combining the advantages of batch and single-wafer processes. It integrates solvent immersion, high-pressure resist removal, and two-fluid cleaning. The immersion tank is equipped with megasonic technology and can be flexibly configured. Featuring two-fluid and high-pressure jet cleaning, it delivers excellent resist and particle removal performance. Its modular design allows for expansion, and its stable and consistent program control ensures high wafer cleanliness.
