Cercate di contattare i team di produttori di semiconduttori per le attrezzature di processo a umido? Meraif supporta gli acquirenti del sud-est asiatico con soluzioni per wafer di silicio, wafer IC, packaging avanzato, substrati IC e SMT, grazie alla tecnologia brevettata degli ugelli, alla pulizia a spruzzo con vuoto a pressione negativa e all'esperienza nei fluidi supercritici per la pulizia di alta precisione dei semiconduttori.
Photoresist removal and metal stripping wafer system for semiconductor wet processing, designed for cleaning, stripping and surface preparation in fabs. We support global sourcing of scarce equipment, parts, accessories and customized automation solutions for wafer manufacturing lines worldwide.
This equipment supports 6/8/12-inch wafers, combining the advantages of batch and single-wafer processes. It integrates solvent immersion, high-pressure resist removal, and two-fluid cleaning. The immersion tank is equipped with megasonic technology and can be flexibly configured. Featuring two-fluid and high-pressure jet cleaning, it delivers excellent resist and particle removal performance. Its modular design allows for expansion, and its stable and consistent program control ensures high wafer cleanliness.
