Einkristall-Wafer-Reinigungsmaschine für Halbleiterfabrik

This single crystal wafer cleaning machine is designed for semiconductor fabs and labs needing stable wet cleaning, automated wafer handling, and contamination control. We support sourcing of equipment, scarce spare parts, accessories, installation coordination, and after-sales supply chain service.

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This equipment supports 8/12-inch wafers; switching is simple with a FOUP adapter. It integrates multiple cleaning functions and can be equipped with a megasonic system, suitable for cleaning particles, flux, and photoresist residue. The chamber is sealed and clean, and the software is user-friendly, improving production efficiency and stability.