Looking to contact semiconductor manufacturer teams for wet process equipment? Meraif supports Southeast Asia buyers with solutions for silicon wafers, IC wafers, advanced packaging, IC substrates, and SMT—backed by patented nozzle technology, vacuum negative pressure spray cleaning, and supercritical fluid expertise for high-precision semiconductor cleaning.
This single crystal wafer coating and spinning machine is built for semiconductor wafer surface processing, uniform coating, spin drying, and fab automation. The enclosed system supports stable wafer handling, touch-screen operation, and global sourcing for spare parts, accessories, and upgrades.
Suitable for 6/8/12-inch photoresist spin coating, uniform coating, and curing; can handle AP/AT coating and also handle cleaning and baking; equipped with precision filtration, 5000RPM spin coating, and multi-point uniform heating to ensure process uniformity; supports mainstream communications, complies with semiconductor standards, and can automatically/manually load and unload materials.
